Version 1.7

Lecture: I could not resist

Resists for Electron Beam Lithography (EBL)

Photoresists are one of the essential ingredients for chip manufacturing and micro/nano engineering.
We will show how we’re using them in a DIY Electron Beam Lithography set-up and how you’re able to cook your own cheap resists and mix your own developers.

Resists? What's that?

  • What are their applications

  • How does it work (types (positive/negative), chemistry, proximity effect, dosage etc)

EBL? What's that?

  • How does it work

  • Pros & cons: comparison between EBL (slow) photolithography (fast)

  • Which resist can I use for EBL

DIY cooking of PMMA based resists

  • Comparison of different solvents

Composition of different developers

  • Comparison of different developers


  • Usage as a mask

  • Usage as a structural dielectric material

  • ...(?)

The EBL exposure process

  • simple SEM retrofitted with an EBL controller

  • The common file formats (GDSII & OASIS)

  • Scan-Gen: how to generate the proper curves for the exposure

  • Hardware: off-the-shelf embedded modules like the RedPitaya

  • Generation of different filling curve styles, calibration, compensation of the proximity effect, correction of the SEMs intrinsic parameters, dosage!

  • Fiducial detection and alignment for multi-pass/multi-layer processes

Stuff comes together

  • walk through the complete process along a simple example

More Examples

Thanks & Credits

Q & A


Day: 2020-12-30
Start time: 14:00
Duration: 00:40
Room: rC2
Track: Hardware & Making
Language: en



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